0520-057-0002

Product Overview: The PE-200 is a complete industrial grade plasma treatment solution capable of plasma cleaning, etching, reactive ion etching (RIE), and more. This model is perfect for manufacturers, universities, research facilities, or any other company in need of a cost-effective, high yield plasma processing solution. This model is available in one of three possible configurations: 1) Plasma Cleaning/Plasma Etching 2) Reactive Ion Etching (RIE) 3) Convertible Configuration – Includes both isotropic and anisotropic plasma processing in a single system. Removable tray configuration. Product Features: Custom Sized Vacuum Chamber, Number/Size of Electrodes To ensure your system is able to specifically meet your throughput requirements Reactive Ion Electrodes Enables reactive ion etching MHz Power Supplies with Automatic Matching Network Higher watt/frequency power supplies PC-based Control System For fully automatic system control, multi-step process sequencing, multiple recipe storage, data logging/trending, events/alarms, etc. Electrostatic Shielding Greatly increases process uniformity by eliminating excess etching at the outer bounds of the processed material Temperature Control System To maintain specific temperatures in the processing chamber for enhanced uniformity and application-specific needs Dry Vacuum Pump For more control over the process chamber pressure Chamber and Vacuum Pump Purge Systems / Air Dryer / Purge Gas Generator To ensure thorough removal of contaminants from operating equipment, providing uniformity and increasing longevity Vacuum Pump Oil Mist Eliminator Captures oil from vacuum pump exhaust Vacuum Pump Oil Filtration Filters the vacuum pump oil down to a 3 micron level which increases the longevity of the oil and the vacuum pump Automatic Vacuum Control Provides automation of the process chamber pressure Additional Digital Mass Flow Controllers Provides digital automation and monitoring of process gases Software Configurable Gas Steering Matrix Designed to allow for up to 5 process gas inputs; 3 are selectable at any time by software driven controls Low Gas-Source Alarm Notification for when your process gas container needs replenished Light Tower For easy visualization of the steps of the plasma processing sequence Fume Scrubber To eliminate hazardous fumes/contaminants from the chamber/vacuum pump exhaust General: Manufacturer: Plasma Etch Model Name: Plasma System Model Number: PE-200 Inventory Number: 0520-057-0002 Category: Heat Treating Serial Number: 062511 Specifications: Capacity: 13 x 15 in. Weight: 550 lbs. Electrical: 3/50/60/120/208 Chamber Dimensions: 17 x 17 x 14 in. Unit Dimensions: 35 x 31 x 31 in. Vacuum Pump Weight: 150 lbs. Generator: 300 W Vacuum Pump: 29 cfm